120 nm resolution and 55 nm structure size in STED-lithography

نویسندگان
چکیده

برای دانلود باید عضویت طلایی داشته باشید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Maskless Plasmonic Lithography at 22 nm Resolution

Optical imaging and photolithography promise broad applications in nano-electronics, metrologies, and single-molecule biology. Light diffraction however sets a fundamental limit on optical resolution, and it poses a critical challenge to the down-scaling of nano-scale manufacturing. Surface plasmons have been used to circumvent the diffraction limit as they have shorter wavelengths. However, th...

متن کامل

Dual-color STED microscopy at 30-nm focal-plane resolution.

Owing to its sensitivity and noninvasiveness, far-field fluorescence microscopy would be almost ideal for biological imaging if the resolution of its established variants were not limited by diffraction toDr l=ð2n sinaÞ, with l denoting the wavelength of light, n the index of refraction, and a the aperture angle of the objective lens. The first concept to overcome these limits in a fundamental ...

متن کامل

Achieving sub-10-nm resolution using scanning electron beam lithography

Achieving the highest possible resolution using scanning-electron-beam lithography (SEBL) has become an increasingly urgent problem in recent years, as advances in various nanotechnology applications have driven demand for feature sizes well into the sub-10-nm domain. While SEBL has the highest resolution of nearly any conventional patterning technique available, reliably defining features at t...

متن کامل

Hybrid nanoimprint-soft lithography with sub-15 nm resolution.

We developed a hybrid nanoimprint-soft lithography technique with sub-15 nm resolution. It is capable of patterning both flat and curved substrates. The key component of the technology is the mold, which consists of rigid features on an elastic poly(dimethylsiloxane) (PDMS) support. The mold was fabricated by imprinting a reverse image onto the PDMS substrate using a UV-curable low-viscosity pr...

متن کامل

244-nm imaging interferometric lithography

Imaging interferometric lithography, combining off-axis illumination, multiple exposures covering different regions of spatial frequency space, and pupil plane filters to ensure uniform frequency-space coverage, is a relatively new imaging concept that provides an approach to accessing the fundamental, linear-systems-resolution limits of optics. With an air medium between the lens and the wafer...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

ژورنال

عنوان ژورنال: Optics Express

سال: 2013

ISSN: 1094-4087

DOI: 10.1364/oe.21.010831